Understanding Ultra Low-k Dielectric Films

Dielectric materials are of critical importance in the function of microelectronic devices. This article outlines why and the mechanical characterization of Ultra Low-k Dielectric Films.

Layered Foam/Film Polymer Nanocomposites with Highly Efficient EMI Shielding Properties and Ultralow Reflection

PDF] Porous Low-Dielectric-Constant Material for Semiconductor Microelectronics

Understanding Ultra Low-k Dielectric Films

Thin Film Transistors

Electronics, Free Full-Text

Capacitor Fundamentals: Part 8 – Dielectric Classifications

An ultralow-k dielectric derived from a fluorinated polybenzoxazole composite film with yolk–multishell mesoporous silica nanostructures - Journal of Materials Chemistry C (RSC Publishing)

Porous Low-Dielectric-Constant Material for Semiconductor Microelectronics

Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications, Journal of Materials Research

Depth Profile Characterization, SIMS